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November 13-14, 2017 Paris, France
5
th
International Conference on
PLASMA CHEMISTRY AND
PLASMA PROCESSING
Journal of Biotechnology and Phytochemistry
Volume 1, Issue 2
Plasma Chemistry 2017
The decomposition mechanisms of SF
6
and its
candidate C
5
F
10
O
Xiaohua Wang
Xi’an Jiaotong University, China
T
he decomposition mechanisms of SF
6
with impurities
(moisture and trace oxygen) and one of its candidates-
C
5
F
10
O, were thoroughly studied in this paper. The quantum
chemistry methods were adopted to investigate the
decomposition processes of SF
6
and C
5
F
10
O. We also calculated
the rate constants of the chemistry reactions included in above
processes over a large temperature range from 300 K to 12,000 K.
The dominant reactions and species in the decomposition were
finally determined. The decomposition mechanisms of SF
6
are
hoping to lay a theoretical basis for service life condition online-
monitoring of power equipment by analyzing SF
6
decomposition
components. And the results of C
5
F
10
O play an important role in
the feasibility study on alternative gas for SF
6
and can be used to
further investigate the corresponding eco-friendly switchgear in
the future.
Biography
Xiaohua Wang received his BSc degree from Chang’an University, Xi’an,
China in 2000 and PhD degree from School of Electrical Engineering of Xi’an
Jiaotong University, China, in 2006. His research interests are mainly in plasma
chemistry, design and fault diagnosis technologies of electrical apparatus.
He has published more than 100 peer-reviewed papers. He is an awardee of
supporting program of new century excellent talents in University of the Ministry
of Education.
xhw@mail.xjtu.edu.cnXiaohua Wang, J Biot Phyt 2017