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November 13-14, 2017 Paris, France
5
th
International Conference on
PLASMA CHEMISTRY AND
PLASMA PROCESSING
Journal of Biotechnology and Phytochemistry
Volume 1, Issue 2
Plasma Chemistry 2017
Low-pressure plasma-etching of organic
materials for optical applications
U Schulz
Fraunhofer Institute for Applied Optics and Precision Engineering, Germany
D
irect plasma etching is a powerful method for producing
antireflective nanostructures on transparent organic
materials. The nanostructure formation depends on the
chemical composition of the substrates and as well on the
plasma conditions applied. The chemical composition of
several organic materials modified using plasma was studied
with infrared reflection absorption spectroscopy (IRRAS).
The investigations indicate a change of chemical composition
even during the first few seconds of plasma etching. It is
assumed that the modified surface layer is essentially involved
in the structure formation process. The most sophisticated
optical application is a curved lens in which the antireflection
function is maintained throughout the visible spectral range
and over an extended range of incident light angles. Amultiple
etching process for polymer substrates and organic layers
will be introduced. By depositing and etching of organic
layers step-by-step on etched polymer substrate a broadband
antireflective performance was achieved.
Ulrike.Schulz@iof.fraunhofer.deJ Biot Phyt 2017