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Mater Sci Nanotechnol 2017 | Volume 1 Issue 2
allied
academies
Nanomaterials and Nanochemistry
November 29-30, 2017 | Atlanta, USA
International Conference on
N
ano-fabrication plays a key role in the development
of nano-science and nano-technologies and their
applications. Photolithography is still now the dominant
method for patterning nano-structures with a feature size
down to few nm on a large wafer or substrate. However,
there are some serious limitations and restrictions in this
method which make it not so available to many researchers.
Alternative nano-fabrication technologies have been
developed in the past two decades. Among them, nano-
imprinting and nano-contacting lithography have shown
great potentials for fabricating various kinds of nano-
structures over a large pattern area with a relatively simple
and cost-effective approach. This presentation will address
several innovative methods based on nano-imprinting and
contact printing lithography. First of all, a soft photomask
lithography method is developed which can improve
the patterning resolution of conventional contact-type
photolithography from µm to sub-µm or even nm scale.
As an example, this method has been used for fabricating
conical-shape surface structures on sapphire substrate of a
light-emitting diode to enhance light extraction efficiency.
Secondly, a metal contact printing lithography has been
developed for patterning metallic nano-structures on both
hard and soft substrates. Following by thermal annealing,
one can achieve various kinds of metallic nano-particles
which are highly uniform in particle size and deployed
precisely and regularly on a substrate. Localized surface
plasma resonance (LSPR) can be excited for many biomedical
and optoelectronic applications. Finally, a curved surface
lithography will be addresses which can directly pattern
nano-structures not only on a planar substrate but also on a
convex or concave surface of a substrate. Metallic, polymer,
or dielectric nano-structures or a combination of them can
be created by combining these lithography methods along
with other standard material processing methods. The
common features shared by all these proposed lithography
methods are small line width, large patterning area, using
simple equipment readily available in laboratories, and cost-
effective.
Speaker Biography
Dr. Yung Chun Lee received his B.S. degree in Mechanical Engineering (1985) and
M.S. degree in Applied Mechanics (1989) both from National Taiwan University,
Taipei, Taiwan, and Ph.D degree in Theoretical and Applied Mechanics (1994) from
Northwestern University, IL, USA. He was a post-doc. researcher (1994-1996) in the
Department of Engineering and Applied Physics, Cornell University, NY, USA, and a
project engineer (1996-1997) in Hon-Hai Precision Industry Inc., Taipei, Taiwan. He
joined the Department of Mechanical Engineering, National Cheng Kung University
(NCKU), Tainan, Taiwan in 1997 and is now a Distinguished Professor there.
e:
yunglee@mail.ncku.edu.twYung Chun Lee
National Cheng Kung University, Taiwan
Nano-contact printing lithography for preparing large-area nano-structures with
industrial applications