nano-chemistry-2017-keynote

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Notes:

Mater Sci Nanotechnol 2017 | Volume 1 Issue 2

allied

academies

Nanomaterials and Nanochemistry

November 29-30, 2017 | Atlanta, USA

International Conference on

nthisstudy,wesynthesizeda-C:Hfilmsbyfilamentarydielectric

barrier discharge (FDBD) to improve their characteristics

compared to the films synthesized by atmospheric pressure

plasma-enhanced chemical vapor deposition. The discharge

type was transited from glow DBD (GDBD) to FDBD by

increasing the gap between the electrodes from1mm to 4mm.

The hydrogen concentration of the a-C:H films synthesized by

FDBD was reduced compared to that of the films synthesized

by GDBD. The hardness of the films is increased from 3.7 GPa to

11.9 GPa by using FDBD. These results show that the hard a-C:H

films can be synthesized at low temperature in a large area by

FDBD.

Speaker Biography

In 1985, Dr. Tetsuya Suzuki is graduated from Inorganic Materials department of

Tokyo Institute of Technology and in 1990; he did his Ph.D from Nuclear Engineering

Department of same Institute. Currently he is working as a director at Keio Leading-

Edge Laboratory, Japan.

Tetsuya Suzuki

Keio University, Japan

Hard carbon and SiO: CH films synthesized under atmospheric pressure