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November 13-14, 2017 Paris, France
5
th
International Conference on
PLASMA CHEMISTRY AND
PLASMA PROCESSING
Journal of Biotechnology and Phytochemistry
Volume 1, Issue 2
Plasma Chemistry 2017
Revealing structures and embedded interfaces with
pulsed RF GDOES
Patrick Chapon
and
Sofia Gaiaschi
Horiba, France
P
ulsed RF GDOES is a fast elemental depth profile technique
capable tomeasure all elements (includingH, D, O, C etc) with
easy sample mounting (Image 1). With the recent introduction
of DIP – an online differential interferometer - it also allows
to accurately measure erosion rates and layer thickness with
nanometric precision. The specificities of the GD plasma (high
density, low average energy of the sputtering particles) make it
in addition a very interesting tool to reveal structures for SEM
observation and EBSD measurements. Some examples will
be shown on flat surfaces and on cross sections. Changing the
plasma gas from the classical Ar to a gas mixing with O addition
offers Ultra-Fast Sputtering (UFS) of polymeric layers with
excellent depth resolution and permits to access to embedded
interfaces below organic coatings. The mechanisms of sputtering
with “UFS” will be discussed and multiple applications ranging
from PV to packaging or Li batteries will be presented.
Biography
Patrick Chapon is working as products Manager at Horiba Company, France.
He started his employment duration 20 yrs at Longjumeau, France. He received
his graduation form IFP graduate engineering school in the field of laser.
PatrickChapon@horiba.comPatrick Chapon et al., J Biot Phyt 2017