allied
academies
Notes:
Page 17
November 13-14, 2017 Paris, France
5
th
International Conference on
PLASMA CHEMISTRY AND
PLASMA PROCESSING
Journal of Biotechnology and Phytochemistry
Volume 1, Issue 2
Plasma Chemistry 2017
Densities of active species in N
2
RF and HF afterglows
A Ricard
1
, J P Sarrette
1
, Y Wang
2
and
Y K Kim
2
1
University of Toulouse, France
2
Ajou University, South Korea
N
2
flowing afterglow emissions have been analyzed by
optical emission spectroscopy in tubes of 21 and 18 mm
internal diameter connected to RF and HF sources available
in Suwon and Toulouse, respectively. The N
2
1
st
pos (580 nm),
2
nd
pos (316 nm) and N
2
+ 1
st
neg (391.4 nm) band system
intensities were recorded across the tube diameters from the
pink (early) to the late afterglows at pressure 6-8 Torr, total flow
rate 0.5-0.6 slm and input power of 100 watt. After calibration
of the N atom density by NO titration, the concentrations of
N-atoms, O-atoms coming from gas impurities, N
2
(X, v>13),
N
2
(A) metastable molecules and N
2
+ ions were determined
in N
2
afterglows. It is found that N–atom density nearly
constant from the pink to the late afterglow. For similar
afterglow times, active species densities are higher in HF than
in RF: 2 and 0.4x10
15
cm-
3
, respectively. Anatase nanocrystals
and ALD (Atomic Layer Deposition) TiO
2
samples were
exposed to the RF and HF afterglows at room temperature.
XPS analysis of samples submitted to the RF afterglow has
shown that the best N/Ti coverage: 0.24 was obtained in the
N
2
late afterglow where the N atoms are the most populated
active species. In the HF late afterglow, the N/Ti coverage was
limited to 0.04 in spite of higher N-atom density: (1-2)x10
15
cm-
3
. Such results are explained by higher O-atom impurity
in HF: 2x10
13
cm-
3
in comparison to 8x10
11
cm-
3
in RF. Then,
the N/O ratios in the RF and HF afterglows were respectively
(0.5-1)x102 and 5x102 with the same variations as found for
the N/Ti coverages.
Biography
A Ricard worked at Ecole Polytechnique as a physicist from (1960-1962).
Then form 1962-1964 he worked at Institut Optique as Engineer, from 1964-
1967 worked at Sud-Aviation as Engineer, from 1967- 2007 he worked as a
researcher in CNRS. He received his PhD in 1971 form University of Toulouse.
He is expertise in the field of plasma spectroscopy, kinetics of plasma excited
species, applications to surface treatments.
ricard@laplace.univ-tlse
A Ricard et al., J Biot Phyt 2017