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May 16-17, 2019 | Prague, Czech Republic
2
nd
International Conference on
22
nd
International Conference on
Nanomaterials and Nanotechnology
Advanced Nanoscience and Nanotechnology
Joint Event
&
Journal of Materials Science and Nanotechnology | Volume 3
Mater Sci Nanotechnol, Volume 3
Notes:
A novelty in the current CVD techniques: Plasma radicals assisted polymerization via
chemical vapour
Bianca Rita Pistillo, Kevin Menguelti
and
Damien Lenoble
Luxembourg Institute of Science and Technology, Luxembourg
T
he terrific grown in the last forty years of chemical
vapor deposition (CVD) allowed this fabrication process
to become as a fundamental element in many industrial
products, such as semiconductors, optoelectronics, optics and
many others. Despite this strong advance, the technology still
faces many challenges and new techniques are developing all
around to world. Plasma Radicals Assisted Polymerization via
Chemical Vapour Deposition (PRAP-CVD) has been developed
at Luxembourg Institute of Science and Technology as an
efficient alternative to conventional vapor-based processes
of conductive thin films. In PRAP-CVD, oxidative radicals are
generated by a remote plasma chamber from a selected
initiator and precursor is injected directly in the process
chamber. The process is based on the concomitant but
physically separated injection of low-energy oxidative radical
initiators and vaporized precursor species into the reactor
where temperature and pressure are finely controlled. A few
advantages of making the process completely dry includes
the possibility of processing solvent-sensitive substrates such
as paper, overcoming the effects of rinsing on the underlying
films in the case of multilayer structures. Moreover,
PRAP-CVD allows the deposition of highly conformal
coatings, which accurately follows the geometry of the
underlying substrate independently from its nature. Poly (3,
4-ethylenedioxythiophene has been chosen as a case study to
demonstrate the effectiveness of this technique. In this work,
the properties of PRAP-CVD PEDOT films and its applications
will be presented.
Speaker Biography
Bianca Rita Pistillo is currently a research and technology associate at
Luxembourg Institute of Science and Technology in Luxembourg. She
earned her PhD in Chemistry of Innovative Materials at University of
Bari (Italy) in 2009. After completing her PhD, she accepted a position as
researcher at University of AldoMoro (Italy), where she worked for 3 years.
During that time, she increased her expertise on chemical/morphological
surface nanomodification by Chemical Vapour Depositions. In 2012, she
accepted to move to LIST jointing the nanomaterials and nanotechnology
unit, where she has started to develop a novel technique named Plasma
Radicals Assisted Polymerization – CVD, demonstrating as an efficient
alternative to conventional vapour based processes. PRAP-CVD is also
characterized by a quite unique degree of conformality of deposited films
on 3D complex substrates. In 2017, she was awarded the IAAM Scientist
Medal by the International Association of Advanced Materials, recognizing
her contribution to nanomaterials field.
e:
biancarita.pistillo@list.lu